The Helium Ion Microscope has been described as an impact technology offering new insights into the structure and function of nanomaterials [1]. Combining a high brightness Gas Field Ion Source (GFIS) with unique sample interaction dynamics, the helium ion microscope provides images offering unique contrast and complementary information to existing charged particle imaging instruments such as the SEM and TEM [2]. Formed by a single atom at the emitter tip, the helium probe can be focused to below 0.25nm offering the highest recorded resolution for secondary electron images. The small interaction volume between the helium beam and the sample also results in images with stunning surface detail .
Besides imaging, the helium ion beam can be used for fabricating nanostructures at the sub-10nm length scale.
Recently, the Gas Field Ion Source has been modified and the gun redesigned to allow the use of both He and Ne source gases. The neon probe size is greater than helium and is measured between 1-2nm. The sputter yield of Ne is about 30X higher than He, and the Ne beam has a shallower penetration depth resulting in lower sub-surface damage. This work has culminated in the development of a gas field ion source that can operate with He and Ne. In addition to those 2 high resolution ion beams, the latest implementation of this technology – the Orion NanoFab – is equipped with a state of the art Ga column. Combining He, Ne and Ga beams in one single tool it represents a versatile nano fabrication workstation.
In this talk, we will present new applications and software solutions combining Helium, Neon and Ga beams for complex nanofabrication tasks like in the fields of High Temperature Superconductors and Graphene.